Scientific Visualization, 2018, volume 10, number 1, pages 128 - 134, DOI: 10.26583/sv.10.1.10
Visualization of the pores in the thin film atomistic structure
Authors: Y. S. Lagutin1, A. A. Lagutina2, F. V. Grigoriev3, V. B. Sulimov4, A. V. Tikhonravov5
Lomonosov State University, Research Computing Center
Moscow, 119991, Russia
1 ORCID: 0000-0002-8449-7696, lagutin.math@gmail.com
2 ORCID: 0000-0001-7599-2882, lagutina.math@gmail.com
3 ORCID: 0000-0001-6893-3008, fedor.grigoriev@gmail.com
4 ORCID: 0000-0002-7102-6107, vladimir.sulimov@gmail.com
5 ORCID: 0000-0003-4240-7709, tikh@srcc.msu.ru
Abstract
The different methods of the visualization of the pores in the thin film structures that obtained by means of deposition process simulation, are suggested. Visualization is performed using of the VisualMolecularDynamics program facilities and based on the building of the isodensity surfaces. Objects of the visualization are atomic clusters of silicon dioxide deposited with different sputtering energies of Si atoms which are modeled on supercomputers "Lomonosov" and "Lomonosov-2". The dependence of the thin films porosity on the deposition conditions is demonstrated.
Keywords: molecular dynamic, thin film growth, silicon dioxide, porosity, pores visualization.
PACS:81.15.Aa
